Effect of transition metal-alloying on the properties of nitride and oxide films

Abstract

Recently, nitride-and oxide films were used in tool applications. However, single films (oxide or nitride only) might not be sufficient to protect the matrix from harsh working environment. Combination of two or more single films, might offer potential alternatives to this problem. The properties of nitride-and oxide films could be modified by adding other elements. Cr is one alloying element in a single TiN thin film, offering good mechanical and corrosion properties. Also, to achieve good electrical and physical properties of oxide films, Ru addition to a single In2O3 film is an attractive method. Therefore, this research aims to investigate the effect of transition metal-alloying element on single nitride-and single oxide films to obtain proper films properties by using DC magnetron sputtering. After adding Cr into TiN film to be (Ti,Cr)N film with control film structure. An effect of film structure changes from columnar to equiaxed by increase substrate temperature from room temperature (RT) to 190 ºC, causes the reduction of surface roughness from 2.35 nm to 1.93 nm, Hardness of (Ti,Cr)N film increases from 16.12 GPa to 24.79 GPa, and Ecorr can be increased from -460 mV to -320 mV while Icorr decreases from 0.15 mA/cm2 to 0.02 mA/cm2 . Therefore, (Ti,Cr)N grown at 190 °C give the better protective film than that growth at RT. In case of oxide film, after adding Ru into In2O3 to be In1−xRuxOy film. The best condition found in thick ITO (150-nm)/ultrathin In0.38Ru0.62Oy (3 nm) bilayers had an effective work function of 5.3 eV, high transmittance of 86%, and low specific resistivity of 9.2 × 10−5 Ω cm.